Nanoscale Chemistry and Tribology of Functional Surfaces

The next generation of lithography systems demands unprecedented positional accuracy of wafers on their supporting structures, fundamentally governed by single-asperity interactions. This research aims to elucidate the tribological behavior of relevant coating materials by examining the interplay between wear and surface chemistry at the nanoscale. Utilizing Atomic Force Microscopy-based Infrared Nanospectroscopy (AFM-IR), this project aims to achieve high surface sensitivity and nanoscale resolution to investigate chemical changes within single-asperity wear tracks. The project will explore the degradation and repair mechanisms of Self-Assembled Monolayers (SAMs) and Diamond-Like Carbon (DLC) coatings, and identify contaminants on wafer surfaces. By addressing critical questions regarding the chemical processes occurring at single-asperity contacts and the impact of environmental factors on these changes, this research aims to enhance the precision and reliability of lithographic processes in semiconductors industry.